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Product Introduction

Bump

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WAFER BUMPING PROCESS
PROCESS BASE METAL APPLICATION CHEMICAL TYPE L(liquid), P(powder) SPEC
WAFER BUMPING
PROCESS
Cu, Ni Surfactant for Copper bump etchant L Customization is available to perfectly align with the customer’s specific requirements.
Copper bump etchant L
TiW Alkali type TiW bump etchant L
Ti Acid type Ti bump etchant L
Alkali type Ti bump etchant L
Ni Nickel bump etchant L
Ni-V Nickel-Vanadium alloy bump etchant L
Al Aluminium bump etchant L
Au Gold bump etchant L